Following the Memorandum of Understanding (MoU) on the Electronic Priority Document Exchange (PDX) Program for Design Patent Applications of 2019 between the Taiwan Intellectual Property Office (TIPO) and the Japan Patent Office (JPO), the TIPO and the Korean Intellectual Property Office (KIPO) also signed an MoU on the Electronic Exchange of Priority Documents for Design Patent Applications on November 12, 2021. As a result, applicants will be able to more conveniently claim priorities when filing design patent applications between the TIPO and the KIPO.

Priority documents are important documents for patent applications. According to the MoU on the Exchange of Industrial Property Information and the Electronic Exchange of Priority Documents between the Taipei Mission in Korea and the Korea Mission in Taipei signed on June 15, 2015, priority documents for invention patent applications and utility model patent applications can be transferred electronically between the TIPO and the KIPO. However, priority documents for design patent applications were not included in the scope of this MoU. In order to extend the electronic exchange of priority documents, the TIPO and the KIPO decided to establish the electronic PDX program for design patent applications. Hence, the TIPO and the KIPO signed a new MoU for Design Patent Applications on November 12, 2021, thereby saving time in transferring paper copies. In addition, this new MoU will simplify procedures for design patent applications between the TIPO and the KIPO and will establish a more comprehensive exchange mechanism of priority documents.

The TIPO and the KIPO will carry out system development and conduct testing for the new MoU. According to the schedule announced by the TIPO and the KIPO, the electronic PDX program for design patent applications is expected to be formally implemented in July 2023 to provide applicants with more convenient examination services.

(Translated and adapted based on News published on the TIPO’s website) 

*Section Chief of International Patent Division at Tai E International Patent & Law Office